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Illustration of the plasma-enhanced ALD process for the deposition of... | Download Scientific Diagram
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On the Mechanisms of SiO2 Thin-Film Growth by the Full Atomic Layer Deposition Process Using Bis(t-butylamino)silane on the Hydroxylated SiO2(001) Surface | The Journal of Physical Chemistry C
Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study - RSC Advances (RSC Publishing)
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